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SEMINAR: TITLE: Fabrication and characterization of Al nanomechanical resonators for coupling to nanoelectronic devices", BY: Dr. Khalil Harrabi, Physics Department, KFUPM, DATE & TIME: Sunday 26 February 2012, Time: 11:00 am, LOCATION: 6/125

( 02/26/2012 to 02/26/2012)
2012-02-26T09:00:00Z

 

 
KFUPM
Physics Department
 
Fabrication and characterization of Al nanomechanical resonators for coupling to nanoelectronic devices
 
Seminar by
 
Dr. Khalil Harrabi
Physics Department, KFUPM
NEC and The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama 351-0198, Japan
 
On Sunday 26 February 2012, Time: 11.00 am
in Building: 6, Room125 (Auditorium)
 
Abstract
We report on a suspension technique for Al doubly clamped beams. The technique is based on two consecutive reactive ion etching processes in CF4 plasma, anisotropic and isotropic, of SiOx on which Al layer is deposited. With this technique, Al doubly clamped beams were fabricated. One of the beams was characterized using a magnetomotive measurement scheme at low temperatures. The developed suspension technique is suitable for the fabrication of Al nanoelectronic devices with a mechanical degree of freedom, in particular, superconducting flux qubits with partly suspended loops.
 
You are cordially invited
 
 
 
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